Bismuth nano-Hall probes fabricated by focused ion beam milling for direct magnetic imaging by room temperature scanning Hall probe microscopy

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SANDHU A., MASUDA H., KUROSAWA K., Oral A., BENDİNG S.

ELECTRONICS LETTERS, vol.37, no.22, pp.1335-1336, 2001 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 37 Issue: 22
  • Publication Date: 2001
  • Doi Number: 10.1049/el:20010908
  • Journal Name: ELECTRONICS LETTERS
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.1335-1336
  • Middle East Technical University Affiliated: No

Abstract

Bismuth nano-Hall probes with dimensions similar to 120 x 120 nm were fabricated by focused ion beam milling and used for the direct room temperature magnetic imaging of crystalline garnet thin films and strontium ferrite permanent magnets by scanning Hall probe microscopy. At driving currents of 40 muA, the Hall coefficient and magnetic field sensitivity of the Bi nano-Hall probes were 3.3 x 10(-4) CYG and 7.2 G/root Hz, respectively.