Admittance behavior and dielectric loss mechanisms in Al/PANI-Silicene/n-Si heterojunctions
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, vol.37, no.7, 2026 (SCI-Expanded, Scopus)
- Publication Type: Article / Article
- Volume: 37 Issue: 7
- Publication Date: 2026
- Doi Number: 10.1007/s10854-026-16902-z
- Journal Name: JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
- Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus, Chemical Abstracts Core, Compendex, INSPEC, MEDLINE
- Middle East Technical University Affiliated: No
Abstract
Hybrid metal-polymer-two-dimensional (2D) semiconductor heterojunctions offer an effective platform for tailoring interface-controlled electrical and dielectric properties. In this study, Al/PANI-Silicene/n-Si Schottky diodes were fabricated and investigated using current-voltage, capacitance-voltage, admittance, and impedance spectroscopy over a wide frequency range. The devices exhibit clear rectifying behavior with an enhanced effective barrier height and reduced reverse leakage current, indicating relatively improved interface quality. Frequency-dependent measurements reveal strong dispersion in capacitance and dielectric loss at low frequencies, which gradually diminish at higher frequencies. Impedance and Nyquist analyses show a single dominant interfacial response, while modulus and dielectric representations indicate non-ideal relaxation behavior associated with a distributed spectrum of interface states. The extracted electrical parameters demonstrate that the incorporation of a Silicene interlayer significantly modifies the interfacial response of PANI-based Schottky junctions. These results provide a measurement-driven understanding of charge transport and dielectric behavior in polymer-2D-Si heterostructures and highlight their potential for advanced electronic device applications.