Design of a rapid thermal processing chamber using an inverse formulation


ERTÜRK H., Gamba M., Ezekoye O. A., Howell J. R.

8th AIAA/ASME Joint Thermophysics and Heat Transfer Conference 2002, St. Louis, MO, Amerika Birleşik Devletleri, 24 - 26 Haziran 2002, (Tam Metin Bildiri)

  • Yayın Türü: Bildiri / Tam Metin Bildiri
  • Basıldığı Şehir: St. Louis, MO
  • Basıldığı Ülke: Amerika Birleşik Devletleri
  • Orta Doğu Teknik Üniversitesi Adresli: Hayır

Özet

This study demonstrates the inverse boundary condition design of a rapid thermal processing chamber with known geometry and properties. The goal of the design is to estimate the required power input for the heaters so that desired thermal conditions are achieved at steady state along the silicon wafer that is to be processed. The chamber considered is a vacuum chamber and the dominant mechanism of heat transfer is thermal radiation. The inverse formulation is used so that a direct solution is possible. However, the resulting set of equations are ill-conditioned that necessities the use of regularization in order to achieve physically reasonable and accurate solutions. The presented methodology is a generic one and can be used together with any radiation solver that is able to present the exchange factors together with any regularization technique. In this study, the Monte Carlo method is used to model the thermal radiation and conjugate gradient method is employed to produce regularized solutions. © 2002 by the author(s). Published by the American Institute of Aeronautics and Astronautics, Inc.