Effect of aluminum thickness and etching time of aluminum induced texturing process on soda lime glass substrates for thin solar cell applications


ÜNAL M. , Nasser H., Gunoven M., Sokmen I., Tankut A., TURAN R.

3rd Turkish Solar Electricity Conference and Exhibition (SolarTR), Ankara, Turkey, 27 - 29 April 2015, vol.12, pp.1201-1205 identifier identifier

  • Publication Type: Conference Paper / Full Text
  • Volume: 12
  • Doi Number: 10.1002/pssc.201510125
  • City: Ankara
  • Country: Turkey
  • Page Numbers: pp.1201-1205
  • Keywords: aluminium induced glass texturing, AIT, haze, a-Si:H solar cells

Abstract

In this study, aluminum induced texturing (AIT) technique is used to increase light absorption in thin film by way of increasing the portion of the diffuse transmitted light (haze). For this purpose, various AIT process parameters such as starting aluminum thicknesses, annealing temperature and time, etching time, etchant's concentrations, and temperature of etching are known to affect the final texture. We have investigated the effect of aluminum thickness and etching time on AIT process while keeping the other parameters fixed. Our results show that by changing initial aluminum thickness and etching time, it is possible to control surface morphology of glass substrate and the resulting optical diffuse transmittance. In addition, diffuse transmittance is increased over the visible range of solar spectra and total absorption by a-Si:H is increased. (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim