Mechanical and optical properties of SiO2 thin films deposited on glass


Simurka L., Ctvrtlik R., Tomastik J., Bektas G., Svoboda J., Bange K.

CHEMICAL PAPERS, vol.72, no.9, pp.2143-2151, 2018 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 72 Issue: 9
  • Publication Date: 2018
  • Doi Number: 10.1007/s11696-018-0420-z
  • Title of Journal : CHEMICAL PAPERS
  • Page Numbers: pp.2143-2151
  • Keywords: SiO2 films, Glass, Mechanical properties, Refractive index, Residual stress, CHEMICAL-VAPOR-DEPOSITION, HIGH-TEMPERATURE NANOINDENTATION, ELASTIC-MODULUS, LARGE-AREA, STRUCTURAL-PROPERTIES, BARRIER LAYER, TIO2 FILMS, DENSE SIO2, SILICA, COATINGS

Abstract

The optical and mechanical properties of amorphous SiO2 films deposited on soda-lime silicate float glass by reactive RF magnetron sputtering at room temperature were investigated in dependence of the process pressure. The densities of the films are strongly influenced by the process pressure and vary between 2.38 and 1.91 g cm(-3) as the pressure changes from 0.27 to 1.33 Pa. The refractive indices of the films shift between 1.52 and 1.37, while the residual compressive stresses in the deposited films vary in the range from 440 to 1 MPa. Hardness and reduced elastic modulus values follow the same trend and decline with the increase of process pressure from 8.5 to 2.2 GPa and from 73.7 to 30.9 GPa, respectively. The abrasive wear resistance decreases with the density of the films.