Deposition of carbon by intense fast electron beam generator

Goktas H., Oke G., Udrea M., Esendemir A.

CZECHOSLOVAK JOURNAL OF PHYSICS, cilt.52, ss.756-761, 2002 (SCI İndekslerine Giren Dergi) identifier

  • Cilt numarası: 52
  • Basım Tarihi: 2002
  • Sayfa Sayıları: ss.756-761


The electron beam generator consists of a fast filamentary discharge in superposition with an ordinary glow discharge in low-pressure gases. The filling gas is helium, argon or nitrogen at approximately 0.1 Torr pressure. The duration of the electron beam is shorter than 30 ns and the peak current intensity is typically 20 A. The deposition of carbon on a substrate has been done by two methods; firstly, the low pressure argon gas was replaced by methane gas as a plasma source and, secondly, a graphite target was used. The high intensity electron beam evaporates at every shot a small amount of the material that is collected by different substrates. Both methods lead to thin layer carbon deposition on the substrates that were analyzed by using Scanning Electron Microscope (SEM).