In this study, we investigated the impact of incorporating graphene with Ga-doped ZnO (GZO) when employing them as a TCO layer on Si-based solar cell. GZO thin films with various thicknesses (50-450 nm) were fabricated by the sputtering method using a single target. The aim here was to determine the GZO film with the optimum thickness to incorporate it with single layer graphene as TCO. This thickness was found to be 350 nm as that was the best crystalline quality found in the Opattern. Further, this sample had the lowest sheet resistance and highest transmission values as confirmed by electrical (sheet resistance), and optical characterizations (transmission). Topographic (SEM and AFM), electrical (resistivity and carrier concentration) measurements were also conducted on the same sample. The graphene film grown on copper in a CVD system was then transferred on top of this sample to fabricate the hybrid TCO structure. We found that graphene integrated GZO hybrid TCO film showed higher sheet resistance due to high sheet resistance of graphene and similar optical properties thanks to high optical transmission of graphene. Employing graphene-based TCO layer in the solar cell resulted in higher open-circuit voltage, consequently improving the conversion efficiency from 10.0% to 11.2%. (c) 2021 Elsevier Ltd. All rights reserved.