Dependence of n-cSi/MoOx Heterojunction Performance on cSi Doping Concentration

Nasser H., Kokbudak G., Mehmood H., TURAN R.

7th International Conference on Crystalline Silicon Photovoltaics (SiliconPV), Freiburg, Germany, 3 - 05 April 2017, vol.124, pp.418-424 identifier identifier

  • Publication Type: Conference Paper / Full Text
  • Volume: 124
  • Doi Number: 10.1016/j.egypro.2017.09.267
  • City: Freiburg
  • Country: Germany
  • Page Numbers: pp.418-424
  • Keywords: cSi/MoOx, Heterojunction solar cell, Schottky junction, Simulation, SOLAR-CELLS, MOOX


In this work, we demonstrate a strong correlation between crystalline silicon (cSi) base doping concentration and the performance of cSi/MoOx heterojunction solar cell by investigating the structure numerically based on Silvaco TCAD simulation tool and experimentally. The doping concentration of n-type cSi was scanned in the 1 x 10(15) - 2 x 10(16) cm(-3) range. Simulation results show that utilizing highly doped cSi wafer degrades the conversion efficiency of cSi/MoOx solar cell. Efficiency of 11.16% has been obtained from simulation results for 1 x 10(15) cm(-3) doping concentration while this value reduces to less than 4% for wafer with a doping concentration of 2 x 10(16) cm(-3). These simulation results were demonstrated experimentally and n-type cSi wafers with two different doping concentrations were considered, 1 x 10(15) and 5.5 x 10(15) cm(-3). The key concept underlying this work is to differentiate explicitly the effect of cSi doping concentration on the performance of cSi/MoOx cell, thus a simple cell design is considered where n-type cSi wafers were heavily phosphorous-doped to form (n(+)) at the front of the Si and thermally evaporated MoOx films with various thicknesses (<15 nm) were inserted at the rear between cSi and Al contact. In accordance to simulation results, highly doped wafer exhibited low conversion efficiency of 3.32% while using lower doped wafer significantly improves the efficiency from 3.32 to 10.9%. (C) 2017 The Authors. Published by Elsevier Ltd.