Alternative HF-free etching solution for aluminum induced texturing of glass surface with improved haze


ÜNAL M. , TANKUT A., TURAN R.

MATERIALS RESEARCH EXPRESS, vol.6, no.8, 2019 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 6 Issue: 8
  • Publication Date: 2019
  • Doi Number: 10.1088/2053-1591/ab2669
  • Title of Journal : MATERIALS RESEARCH EXPRESS
  • Keywords: HF-free etching, aluminum induced texturing, glass texturing, thin film solar cells, NaOH etching, haze, THIN-FILM, ENHANCEMENT, REFLECTOR, TIME

Abstract

Aluminum induced texturing (AIT) is a promising surface conditioning method applied on glass substrates. In conventional AIT process, the reaction products (i.e., Al2O3 and Si) are stripped off the glass surface using an HF-based solution, rendering the process sensitive to etch duration. In this study, an alternative, HF-free chemistry is compared to conventional HF-based etching. We show that newly proposed alkaline-based solution leads to significantly improved diffused transmission, of up to 80%. In addition, the etchant does not interact with the glass surface, enabling effective process control.