Alternative HF-free etching solution for aluminum induced texturing of glass surface with improved haze


ÜNAL M. , TANKUT A., TURAN R.

MATERIALS RESEARCH EXPRESS, cilt.6, 2019 (SCI İndekslerine Giren Dergi) identifier identifier

  • Cilt numarası: 6 Konu: 8
  • Basım Tarihi: 2019
  • Doi Numarası: 10.1088/2053-1591/ab2669
  • Dergi Adı: MATERIALS RESEARCH EXPRESS

Özet

Aluminum induced texturing (AIT) is a promising surface conditioning method applied on glass substrates. In conventional AIT process, the reaction products (i.e., Al2O3 and Si) are stripped off the glass surface using an HF-based solution, rendering the process sensitive to etch duration. In this study, an alternative, HF-free chemistry is compared to conventional HF-based etching. We show that newly proposed alkaline-based solution leads to significantly improved diffused transmission, of up to 80%. In addition, the etchant does not interact with the glass surface, enabling effective process control.