Alternative HF-free etching solution for aluminum induced texturing of glass surface with improved haze

ÜNAL M., TANKUT A., TURAN R.

MATERIALS RESEARCH EXPRESS, cilt.6, sa.8, 2019 (SCI-Expanded) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 6 Sayı: 8
  • Basım Tarihi: 2019
  • Doi Numarası: 10.1088/2053-1591/ab2669
  • Dergi Adı: MATERIALS RESEARCH EXPRESS
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Anahtar Kelimeler: HF-free etching, aluminum induced texturing, glass texturing, thin film solar cells, NaOH etching, haze, THIN-FILM, ENHANCEMENT, REFLECTOR, TIME
  • Orta Doğu Teknik Üniversitesi Adresli: Evet

Özet

Aluminum induced texturing (AIT) is a promising surface conditioning method applied on glass substrates. In conventional AIT process, the reaction products (i.e., Al2O3 and Si) are stripped off the glass surface using an HF-based solution, rendering the process sensitive to etch duration. In this study, an alternative, HF-free chemistry is compared to conventional HF-based etching. We show that newly proposed alkaline-based solution leads to significantly improved diffused transmission, of up to 80%. In addition, the etchant does not interact with the glass surface, enabling effective process control.