Alternative HF-free etching solution for aluminum induced texturing of glass surface with improved haze
MATERIALS RESEARCH EXPRESS, cilt.6, sa.8, 2019 (SCI-Expanded, Scopus)
- Yayın Türü: Makale / Tam Makale
- Cilt numarası: 6 Sayı: 8
- Basım Tarihi: 2019
- Doi Numarası: 10.1088/2053-1591/ab2669
- Dergi Adı: MATERIALS RESEARCH EXPRESS
- Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Anahtar Kelimeler: HF-free etching, aluminum induced texturing, glass texturing, thin film solar cells, NaOH etching, haze, THIN-FILM, ENHANCEMENT, REFLECTOR, TIME
- Orta Doğu Teknik Üniversitesi Adresli: Evet
Özet
Aluminum induced texturing (AIT) is a promising surface conditioning method applied on glass substrates. In conventional AIT process, the reaction products (i.e., Al2O3 and Si) are stripped off the glass surface using an HF-based solution, rendering the process sensitive to etch duration. In this study, an alternative, HF-free chemistry is compared to conventional HF-based etching. We show that newly proposed alkaline-based solution leads to significantly improved diffused transmission, of up to 80%. In addition, the etchant does not interact with the glass surface, enabling effective process control.