Effects of Solvents on Dissolution of Photoresist in Parylene Microchannels

Koydemir H. C., KÜLAH H., ÖZGEN C., Tosun I.

NSTI Nanotechnology Conference and Expo (Nanotech 2012), Santa-Clara, Cuba, 18 - 21 June 2012, pp.372-375 identifier

  • Publication Type: Conference Paper / Full Text
  • City: Santa-Clara
  • Country: Cuba
  • Page Numbers: pp.372-375
  • Middle East Technical University Affiliated: Yes


This paper presents a study for the effects of different types of solvents on dissolution of photo resist inside the parylene micro channels. Theoretical and experimental studies were carried out to model the dynamic behavior of the dissolution. In this account, dissolution rate expressions were derived by taking into account the reaction of resist with the solvent. Micro channels with a cross section of 15 mu m x 50 mu m were fabricated by encapsulating photo resist inside the parylene layers and using glass wafer as substrate. Experimental results indicated that photo resist dissolution in dipolar aprotic solvents was much faster than the other types of solvents. This finding can be used to select alternative chemicals for stripping encapsulated photo resist.