The rapid visualization of resistivity inhomogeneities in high-resistivity semiconductor films


Salamov B., Civi M., Altindal S., Kasap M., Bulur E.

JOURNAL OF INFORMATION RECORDING, vol.23, no.5, pp.437-445, 1997 (Peer-Reviewed Journal) identifier identifier

  • Publication Type: Article / Article
  • Volume: 23 Issue: 5
  • Publication Date: 1997
  • Journal Name: JOURNAL OF INFORMATION RECORDING
  • Journal Indexes: Science Citation Index Expanded, Scopus
  • Page Numbers: pp.437-445
  • Keywords: semiconductor photographic system, high-resistivity CuInSe2 cathode, resistivity inhomogeneities, rapid visualization, PHOTOGRAPHIC SYSTEM

Abstract

This paper describes for the first time an application of an ionization type semiconductor photographic system using a chalcopyrite-type semiconductor (CuInSe2) copper-indium-diselenide film as a target for rapid visulization of resistivity inhomogeneities. The CuInSe2 semiconductor films with a resistivity of 10(7) Omega cm (thickness 0.25 mu m) in a planar gas discharge cell, have been studied. A measurement is realized by recording the spatial distribution of the gas discharge radiation intensity between two parallel electrodes. A gas discharge gap has been formed by a dielectric separator with thicknesses ranging from 40 to 60 mu m. A discharge has been realized in air at pressures from 760-60 Torr. The assessment of the resistivity inhomogeneities is then based on an analysis of the discharge radiation, visualized by a photograph taken through the SnO2 film.