Theoretical and experimental investigation of soft x-rays emitted from TIN plasmas for lithographic application

Demir P., KAÇAR E., AKMAN E., Bilikmen S. K., DEMİR A.

Conference on Ultrafast X-Ray Sources and Detectors, California, United States Of America, 26 - 27 August 2007, vol.6703 identifier identifier

  • Publication Type: Conference Paper / Full Text
  • Volume: 6703
  • Doi Number: 10.1117/12.733149
  • City: California
  • Country: United States Of America
  • Keywords: extreme ultraviolet lithography, tin plasmas, hydrodynamic modelling, collisional radiative modelling, LINE EMISSION, SPECTRA, XENON, MODEL, IONS, SIMULATION, TARGETS
  • Middle East Technical University Affiliated: Yes


Extreme ultraviolet lithography (EUVL) requires an emission of soft x-rays around a wavelength region of 13.5 nm. EHYBRID simulation was made under the laser operation at 1064 nm with a pulse duration of 6 ns. Intensity was changed between 1 x 10(12) W/cm(2) and 5 x 10(12) W/cm(2). Soft X-rays emitted from Sri XII and Sri XIII ions were simulated by using the EHYBRID code. Ion Fractions of the tin ions and the line intensities for different electron temperatures were calculated by using the collisional radiative code NeF.