Formation of Al-Si intermetallic phases


Ozenbas M. , Guler H.

CHEMICAL ENGINEERING COMMUNICATIONS, vol.190, pp.911-924, 2003 (Journal Indexed in SCI) identifier identifier

  • Publication Type: Article / Article
  • Volume: 190
  • Publication Date: 2003
  • Doi Number: 10.1080/00986440390207495
  • Title of Journal : CHEMICAL ENGINEERING COMMUNICATIONS
  • Page Numbers: pp.911-924

Abstract

In this article, a study on the formation of intermetallic compounds at the interface between aluminum thin film and silicon substrate is presented. We studied four systems: Al/Si, Al-(5at%)Fe/Si, Al-(5at%)Cr/Si, and Al-(5at%)Ni/Si. After vacuum deposition of the films, the samples were annealed at different temperatures and time intervals. X-ray, SEM, and EDS analysis showed the sequential formation of several intermetallic phases at the interfaces. Using this data, a model will be given about the formation of the observed intermetallic phases.