MoOx/Ag/MoOx multilayers as hole transport transparent conductive electrodes for n-type crystalline silicon solar cells

Akdemir O., Borra M. Z. , Nasser H., TURAN R. , BEK A.

INTERNATIONAL JOURNAL OF ENERGY RESEARCH, cilt.44, sa.4, ss.3098-3109, 2020 (SCI İndekslerine Giren Dergi) identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 44 Konu: 4
  • Basım Tarihi: 2020
  • Doi Numarası: 10.1002/er.5145
  • Sayfa Sayıları: ss.3098-3109


Substitution of highly doped layers with conventional transparent conductive electrodes as carrier collecting and selective contacts in conventional crystalline silicon (c-Si) solar cell configurations is crucial in increasing affordability of solar cells by lowering material costs. In this study, oxide/metal/oxide (OMO) multilayers featuring molybdenum oxide (MoOx) and silver (Ag) thin films are developed by thermal evaporation technique, as dopant-free hole transport transparent conductive electrodes (HTTCEs) for n-type c-Si solar cells. Semidopant-free asymmetric heterocontact (semi-DASH) solar cells on n-type c-Si utilizing OMO multilayers are fabricated. The effect of outer MoOx layer thickness and Ag deposition rate on the photovoltaic characteristics of the fabricated semi-DASH solar cells are investigated. A comparison of front side pyramid textured and flat surface solar cells is performed to optimize the optical and electrical properties. Highest efficiency of 9.3% +/- 0.2% is achieved in a pyramid textured semi-DASH c-Si solar cell with 15/10/30 nm of HTTCE structure.