JOURNAL OF PHOTOGRAPHIC SCIENCE, cilt.42, sa.3, ss.106-108, 1994 (SCI-Expanded)
A method is described for enhancing the resolution R of a semiconductor photographic system by subjecting it to a homogenous magnetic field. Bi has been chosen as the photographic plate, since it has a large value of the cathode sputtering coefficient which is important in the formation of image by charged particle flux. A considerable increase of the resolution is observed when the applied magnetic field is parallel to the electric field between the electrodes. Effect of the magnetic field on the I - V characteristic of the system is discussed.