Synthesis of Fluorene-Type Thin Film Under Biphenyl/Methane Plasma Environment

Mansuroglu D., Manolache S.

PLASMA PROCESSES AND POLYMERS, vol.12, no.10, pp.1036-1049, 2015 (SCI-Expanded) identifier identifier

  • Publication Type: Article / Article
  • Volume: 12 Issue: 10
  • Publication Date: 2015
  • Doi Number: 10.1002/ppap.201400136
  • Journal Name: PLASMA PROCESSES AND POLYMERS
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.1036-1049
  • Middle East Technical University Affiliated: Yes

Abstract

Fluorene-type (C13H10) thin films were synthesized by using the mixture of biphenyl (C12H10) and methane (CH4) plasma. The reactor is a parallel plate installation; upper electrode is connected to 13.56MHz rf power and lower electrode is grounded. The thin films were deposited by applying a negative bias potential between the substrate and the wall of reactor. The films were investigated by residual gas analysis (RGA), UV-vis spectroscopy, atomic force microscope (AFM) and ellipsometry. They had significant nanostructured properties which were suitable for photovoltaic applications. The conjugation was improved by iodine doping and the optical band gap energy dropped down up to 2.85 eV.