Conversion Efficiency Calculations for Soft X-Rays Emitted from Tin Plasma for Lithography Applications

Demir P., Demir P., KAÇAR E., Bilikmen S. K., DEMİR A.

11th International Conference on X-Ray Lasers, Belfast, United Kingdom, 17 - 22 August 2008, vol.130, pp.281-282 identifier

  • Publication Type: Conference Paper / Full Text
  • Volume: 130
  • City: Belfast
  • Country: United Kingdom
  • Page Numbers: pp.281-282
  • Middle East Technical University Affiliated: Yes


Laser-produced plasmas can be used as extreme ultraviolet (EUV) sources for lithography, operating in the 13.5 nm range. Soft X-rays emitted from laser-produced tin plasma were simulated using the EHYBRID code. Required atomic data for tin ions were calculated using the Cowan code. In the EHYBRID simulations tin stab target is assumed to be irradiated by 1064 nm wavelength Nd:YAG laser. Simulations were performed for different driving laser parameters.