Bat, E. Et Al. 2015. Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography. NATURE COMMUNICATIONS , vol.6 .

Bat, E., Lee, J., Lau, U. Y., & Maynard, H. D., (2015). Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography. NATURE COMMUNICATIONS , vol.6.

Bat, ERHAN Et Al. "Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography," NATURE COMMUNICATIONS , vol.6, 2015

Bat, ERHAN Et Al. "Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography." NATURE COMMUNICATIONS , vol.6, 2015

Bat, E. Et Al. (2015) . "Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography." NATURE COMMUNICATIONS , vol.6.

@article{article, author={ERHAN BAT Et Al. }, title={Trehalose glycopolymer resists allow direct writing of protein patterns by electron-beam lithography}, journal={NATURE COMMUNICATIONS}, year=2015}