Tetelbaum, D. I. Et Al. 2009. Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide. PHYSICS OF THE SOLID STATE , vol.51, no.2 , 409-416.

Tetelbaum, D. I., Mikhaylov, A. N., Belov, A. I., Ershov, A. V., Pitirimova, E. A., Plankina, S. M., ... Smirnov, V. N.(2009). Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide. PHYSICS OF THE SOLID STATE , vol.51, no.2, 409-416.

Tetelbaum, D. Et Al. "Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide," PHYSICS OF THE SOLID STATE , vol.51, no.2, 409-416, 2009

Tetelbaum, D. I. Et Al. "Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide." PHYSICS OF THE SOLID STATE , vol.51, no.2, pp.409-416, 2009

Tetelbaum, D. I. Et Al. (2009) . "Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide." PHYSICS OF THE SOLID STATE , vol.51, no.2, pp.409-416.

@article{article, author={D. I. Tetelbaum Et Al. }, title={Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide}, journal={PHYSICS OF THE SOLID STATE}, year=2009, pages={409-416} }