I. Atilgan Et Al. , "Admittance analysis of an MIS structure made with PECVD deposited a-SiNx : H thin films," JOURNAL OF NON-CRYSTALLINE SOLIDS , vol.249, pp.131-144, 1999
Atilgan, I. Et Al. 1999. Admittance analysis of an MIS structure made with PECVD deposited a-SiNx : H thin films. JOURNAL OF NON-CRYSTALLINE SOLIDS , vol.249 , 131-144.
Atilgan, I., Ozder, S., Ozdemir, O., & Katircioglu, B., (1999). Admittance analysis of an MIS structure made with PECVD deposited a-SiNx : H thin films. JOURNAL OF NON-CRYSTALLINE SOLIDS , vol.249, 131-144.
Atilgan, I Et Al. "Admittance analysis of an MIS structure made with PECVD deposited a-SiNx : H thin films," JOURNAL OF NON-CRYSTALLINE SOLIDS , vol.249, 131-144, 1999
Atilgan, I Et Al. "Admittance analysis of an MIS structure made with PECVD deposited a-SiNx : H thin films." JOURNAL OF NON-CRYSTALLINE SOLIDS , vol.249, pp.131-144, 1999
Atilgan, I. Et Al. (1999) . "Admittance analysis of an MIS structure made with PECVD deposited a-SiNx : H thin films." JOURNAL OF NON-CRYSTALLINE SOLIDS , vol.249, pp.131-144.
@article{article, author={I Atilgan Et Al. }, title={Admittance analysis of an MIS structure made with PECVD deposited a-SiNx : H thin films}, journal={JOURNAL OF NON-CRYSTALLINE SOLIDS}, year=1999, pages={131-144} }