DOĞU, T. Et Al. 2003. Diffusion Resistances and Contribution of Surface Diffusion in TAME and TAEE Production Using Amberlyst-15. INTERNATIONAL JOURNAL OF CHEMICAL REACTOR ENGINEERING , vol.1 .

DOĞU, T., AYDIN GÖL, E., Boz, N., MÜRTEZAOĞLU, K., & DOĞU, G., (2003). Diffusion Resistances and Contribution of Surface Diffusion in TAME and TAEE Production Using Amberlyst-15. INTERNATIONAL JOURNAL OF CHEMICAL REACTOR ENGINEERING , vol.1.

DOĞU, TİMUR Et Al. "Diffusion Resistances and Contribution of Surface Diffusion in TAME and TAEE Production Using Amberlyst-15," INTERNATIONAL JOURNAL OF CHEMICAL REACTOR ENGINEERING , vol.1, 2003

DOĞU, TİMUR Et Al. "Diffusion Resistances and Contribution of Surface Diffusion in TAME and TAEE Production Using Amberlyst-15." INTERNATIONAL JOURNAL OF CHEMICAL REACTOR ENGINEERING , vol.1, 2003

DOĞU, T. Et Al. (2003) . "Diffusion Resistances and Contribution of Surface Diffusion in TAME and TAEE Production Using Amberlyst-15." INTERNATIONAL JOURNAL OF CHEMICAL REACTOR ENGINEERING , vol.1.

@article{article, author={TİMUR DOĞU Et Al. }, title={Diffusion Resistances and Contribution of Surface Diffusion in TAME and TAEE Production Using Amberlyst-15}, journal={INTERNATIONAL JOURNAL OF CHEMICAL REACTOR ENGINEERING}, year=2003}