J. Wolowski Et Al. , "Applications of ions produced by low intensity repetitive laser pulses for implantation into semiconductor materials," RADIATION EFFECTS AND DEFECTS IN SOLIDS , vol.163, pp.589-595, 2008
Wolowski, J. Et Al. 2008. Applications of ions produced by low intensity repetitive laser pulses for implantation into semiconductor materials. RADIATION EFFECTS AND DEFECTS IN SOLIDS , vol.163 , 589-595.
Wolowski, J., Badziak, J., Czarnecka, A., Parys, P., Pisarek, M., Rosinski, M., ... TURAN, R.(2008). Applications of ions produced by low intensity repetitive laser pulses for implantation into semiconductor materials. RADIATION EFFECTS AND DEFECTS IN SOLIDS , vol.163, 589-595.
Wolowski, J. Et Al. "Applications of ions produced by low intensity repetitive laser pulses for implantation into semiconductor materials," RADIATION EFFECTS AND DEFECTS IN SOLIDS , vol.163, 589-595, 2008
Wolowski, J. Et Al. "Applications of ions produced by low intensity repetitive laser pulses for implantation into semiconductor materials." RADIATION EFFECTS AND DEFECTS IN SOLIDS , vol.163, pp.589-595, 2008
Wolowski, J. Et Al. (2008) . "Applications of ions produced by low intensity repetitive laser pulses for implantation into semiconductor materials." RADIATION EFFECTS AND DEFECTS IN SOLIDS , vol.163, pp.589-595.
@article{article, author={J. Wolowski Et Al. }, title={Applications of ions produced by low intensity repetitive laser pulses for implantation into semiconductor materials}, journal={RADIATION EFFECTS AND DEFECTS IN SOLIDS}, year=2008, pages={589-595} }